Wishing everyone a happy Earth Day! #earthday
JSR Micro, Inc.
Semiconductor Manufacturing
Sunnyvale, California 8,313 followers
Driving innovation in semiconductor materials solutions while always maintaining an uncompromising focus on quality.
About us
JSR Micro, Inc. is driving innovation in semiconductor, life sciences, and energy material solutions. As polymer experts, JSR Micro has leveraged its experience and research and development capabilities to expand into new and growing markets while always maintaining an uncompromising focus on quality. Our comprehensive and diverse portfolio of materials allows our customers to solve unique technical and economic challenges within a variety of industries and applications. JSR Micro, Inc. is the US-based subsidiary of JSR Corporation, which operates a responsive, reliable, world-class supply chain and quality program, and a network of manufacturing facilities, sales offices and R&D labs in key markets throughout North America, Asia-Pacific, and Europe. JSR Micro is an innovation partner to its customers, working together to continue to advance today's technologies and to create the breakthroughs of tomorrow. JSR Micro has offices in the US - JSR Micro, Inc., and in Leuven, Belgium - JSR Micro NV. JSR Micro is ISO9001:2008 certified, ISO14001:2004 certified and OHSAS18001:2007 certified and a recipient of Intel's 2014 SCQI award.
- Website
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http://www.jsrmicro.com
External link for JSR Micro, Inc.
- Industry
- Semiconductor Manufacturing
- Company size
- 51-200 employees
- Headquarters
- Sunnyvale, California
- Type
- Privately Held
- Founded
- 1957
Locations
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Primary
Get directions
1280 North Mathilda Ave.
Sunnyvale
Sunnyvale, California 94089, US
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Get directions
JSR Micro NV
Technologielaan 8
Leuven, Vlaams Brabant 3001, BE
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Get directions
1280 N. Mathilda Ave.
Sunnyvale, CA 94089, US
Employees at JSR Micro, Inc.
Updates
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JSR is at the forefront of innovation in response to the increasing demand for PFAS-free materials, driven by stringent regulations. Our cutting-edge PFAS-free PID sample is now ready for testing, showcasing our commitment to sustainable solutions for RDL and packaging applications. Experience the future of environmentally friendly materials and download our information sheet today to learn more!
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Baseball is here! #baseball #openingday
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#IMAPS 20th Device Packaging Conference in Arizona was a success! The exhibit hall was bustling with activity each day. JSR's Hikaru Mizuno hosted a session on 'Novel low loss polymer for advanced IC packaging' on Wednesday, March 20th, with over 80 people in attendance. Looking forward to the 2025 conference! #DevicePackagingConference
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March Madness starts tomorrow, March 19th! #marchmadness #basketball
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The Device Packaging Conference exhibit hall opens on Tuesday, March 19th. Stop by booth #62 to talk to JSR representatives. See you there! #AdvancedPackaging #IMAPS
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Thank you to everyone for your continued hard work, it is truly appreciated! #EmployeeAppreciationDay
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On Wednesday, February 28th, JSR Micro Inc.'s President Mark Slezak participated on the All-Symposium Panel: The Future of EUV at SPIE Advanced Lithography + Patterning Conference This panel had great attendance and engagement on the future of #EUV, with a robust discussion around materials, optics, photo masks, sources, and scanners. As the industries momentum continues around the use of EUV in high volumes #manufacturing, the engineering community is hard at work on next generation solutions using both NA and k1 extensions. An exciting time to be in the industry! #SPIElitho
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Join our President Mark Slezak tomorrow for a must-see session at the #SPIElitho conference! All-Symposium Panel: The Future of EUV 28 February 2024 • 4:00 PM - 5:30 PM PST | Convention Center, Room 210A Panelists in this session will discuss the issues that need to be addressed to extend EUV lithography further and what may ultimately limit its capabilities. We look forward to seeing you there! #EUV #lithography #Inpria
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Join our Lead Scientist Sonia Castellanos at the #SPIElitho conference for a discussion on EUV metal oxide resist thermal chemistry and patterning progress. 26 February 2024 ∙ 2:50 PM - 3:10 PM PST | Convention Center, Grand Ballroom 220C Sonia will discuss the thermal amplification processes via both patterning and chemical data as a function of underlayer, resist, and bake condition. This will assist lithographers in optimizing and comparing different resists, stacks, and bake temperatures. The translation of MOR formulation and process advances to hNA patterning performance is demonstrated using 0.5-NA imaging data collected on the Berkely MET-5, in which we explore pitches ≤ 20 nm. #SPIE #lithography
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